Stress and strain analysis of Si-based III – V template fabricated by ion-slicing
Zhao Shuyan1, 2, Song Yuxin1, Liang Hao1, 2, Jin Tingting1, 2, Lin Jiajie1, 2, Yue Li1, 2, You Tiangui1, 2, Wang Chang1, 2, Ou Xin1, 2, †, Wang Shumin1, 2, 3, ‡
       

(a) The chronicle vertical temperature gradient within the structure A and (b) the strain component εxx at the center of the layers versus time during heating process.