Stress and strain analysis of Si-based III – V template fabricated by ion-slicing

Zhao Shuyan^{1, 2}, Song Yuxin¹, Liang Hao^{1, 2}, Jin Tingting^{1, 2}, Lin Jiajie^{1, 2}, Yue Li^{1, 2}, You Tiangui^{1, 2}, Wang Chang^{1, 2}, Ou Xin^{1, 2, †}, Wang Shumin^{1, 2, 3, ‡}

(a) Optical microscope photo of a B2 sample surface with delamination after deoxidation at about 600°C. (b)–(d) 3D model of the three structures studied. Panels (b) is the overall structure and panels (c) and (d) are zoomed-in view of structure A and structure B1 & B2, respectively. The color indicates the absolute value of the stress component σ_xx at 600°C, and the III–V in panel (d) is taken from structure B2. The lateral dimension of the structure is 10 mm× 10 mm. The layer thicknesses are summarized in Table 1 and some key material parameters in Table 2.