Influence comparison of N<sub>2</sub> and NH<sub>3</sub> nitrogen sources on AlN films grown by halide vapor phase epitaxy

Influence comparison of N₂ and NH₃ nitrogen sources on AlN films grown by halide vapor phase epitaxy

Chen Jing-Jing^{1, 2}, Huang Jun¹, Su Xu-Jun¹, Niu Mu-Tong¹, Xu Ke^{1, 2, 3, †}

The 10 μm × 10 μm AFM images of the as-grown AlN samples: (a) A2, (b) B1, (c) C1, and (d) D1.