Influence comparison of N<sub>2</sub> and NH<sub>3</sub> nitrogen sources on AlN films grown by halide vapor phase epitaxy

Influence comparison of N₂ and NH₃ nitrogen sources on AlN films grown by halide vapor phase epitaxy

Chen Jing-Jing^{1, 2}, Huang Jun¹, Su Xu-Jun¹, Niu Mu-Tong¹, Xu Ke^{1, 2, 3, †}

Optical micrographs of AlN (NH₃) samples: (a) C1, (c) C2, (e) C3, (g) C4; (b) D1, (d) D2,(f) D3, (h) D4.