Influence comparison of N<sub>2</sub> and NH<sub>3</sub> nitrogen sources on AlN films grown by halide vapor phase epitaxy

Influence comparison of N₂ and NH₃ nitrogen sources on AlN films grown by halide vapor phase epitaxy

Chen Jing-Jing^{1, 2}, Huang Jun¹, Su Xu-Jun¹, Niu Mu-Tong¹, Xu Ke^{1, 2, 3, †}

Optical micrographs of AlN (N₂) samples: (a) A1, (c) A2, (e) A3, (g) A4; (b) B1, (d) B2,(f) B3, (h) B4.