Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging

Zhu Jingyuan¹, Zhang Sichao¹, Xie Shanshan¹, Xu Chen¹, Zhang Lijuan², Tao Xulei², Ren Yuqi², Wang Yudan², Deng Biao², Tai Renzhong², Chen Yifang^{1, †}

SEM micrographs of the fabricated zone plates by EBL with local PEC and Au electroplating. (a) The FZPs with the aspect ratio of 4:1 for soft x-ray. The central part is an integrated 2-μm-thick beam stop. (b) The FZPs with the aspect ratio of 15:1. The photos in (a3) and (b3) were taken at the SE2 tilt angle of 70°.