Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging

Zhu Jingyuan¹, Zhang Sichao¹, Xie Shanshan¹, Xu Chen¹, Zhang Lijuan², Tao Xulei², Ren Yuqi², Wang Yudan², Deng Biao², Tai Renzhong², Chen Yifang^{1, †}

Comparisons of the resultant zone plates after electroplating of Au and lift off process, exposed by three different charge distributions, respectively. (a), (b) The zone plates without any proximity correction. (c), (d) The plates with computer generated correction. (e), (f) The plates with local PEC on the top of PEC in (c).