Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging

Zhu Jingyuan¹, Zhang Sichao¹, Xie Shanshan¹, Xu Chen¹, Zhang Lijuan², Tao Xulei², Ren Yuqi², Wang Yudan², Deng Biao², Tai Renzhong², Chen Yifang^{1, †}

The simulation results of development for the resist profiles by three different correction methods: (a) no PEC, (b) PEC, and (c) LPEC. Apparently, the LPEC in dose resulted in the best profile comparing to the other two.