Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging

Zhu Jingyuan¹, Zhang Sichao¹, Xie Shanshan¹, Xu Chen¹, Zhang Lijuan², Tao Xulei², Ren Yuqi², Wang Yudan², Deng Biao², Tai Renzhong², Chen Yifang^{1, †}

Numerical simulations of charge distributions at the depth of 625 nm from the surface of 4-μm PMMA with three different correction methods: (a) without PEC, (b) with a computer generated PEC, and (c) with local PEC.