Improvement of high-frequency properties of Co<sub>2</sub>FeSi Heusler films by ultrathin Ru underlayer

Improvement of high-frequency properties of Co₂FeSi Heusler films by ultrathin Ru underlayer

Wang Cuiling^{1, 2}, Zhang Shouheng¹, Li Shandong^{1, †}, Du Honglei^{1, 3}, Zhao Guoxia¹, Cao Derang¹

(a) X-ray diffraction patterns of the oblique deposited Co₂FeSi thin films with various thicknesses of Ru underlayers. (b) The calculated average grain sizes of various samples.