Improvement of high-frequency properties of Co<sub>2</sub>FeSi Heusler films by ultrathin Ru underlayer

Improvement of high-frequency properties of Co₂FeSi Heusler films by ultrathin Ru underlayer

Wang Cuiling^{1, 2}, Zhang Shouheng¹, Li Shandong^{1, †}, Du Honglei^{1, 3}, Zhao Guoxia¹, Cao Derang¹

The schematic drawing of oblique sputtering device and the geometry of the magnetic anisotropy.