Effect of overdrive voltage on PBTI trapping behavior in GaN MIS-HEMT with LPCVD SiN<sub><italic>x</italic></sub> gate dielectric<xref rid="cpb_29_3_037201fn1" ref-type="fn">*</xref><fn id="cpb_29_3_037201fn1"><label>*</label><p>Project supported by the National Key Research and Development Program, China (Grant No. 2017YFB0402800), the Key Research and Development Program of Guangdong Province, China (Grant No. 2019B010128002), the National Natural Science Foundation of China (Grant No. U1601210), and the Natural Science Foundation of Guangdong Province, China (Grant No. 2015A030312011).</p></fn>

Effect of overdrive voltage on PBTI trapping behavior in GaN MIS-HEMT with LPCVD SiN_x gate dielectric**

Project supported by the National Key Research and Development Program, China (Grant No. 2017YFB0402800), the Key Research and Development Program of Guangdong Province, China (Grant No. 2019B010128002), the National Natural Science Foundation of China (Grant No. U1601210), and the Natural Science Foundation of Guangdong Province, China (Grant No. 2015A030312011).

Que Tao-Tao¹, Zhao Ya-Wen¹, Li Liu-An¹, He Liang², Qiu Qiu-Ling¹, Liu Zhen-Xing¹, Zhang Jin-Wei¹, Chen Jia¹, Wu Zhi-Sheng¹, Liu Yang^{1, †}

(a) Plots of weak g_max degradation versus t_stress, observed under different values of V_gstress and room temperature, (b) linear correlation between Δg_max and ΔV_th, (c) plots of SS degradation versus t_stress, and (d) correlation between ΔSS and ΔV_th.