Atomically flat surface preparation for surface-sensitive technologies

Tang Cen-Yao^{1, 2}, Rao Zhi-Cheng^{1, 2}, Yuan Qian-Qian^{3, 4}, Tian Shang-Jie⁵, Li Hang^{1, 2}, Huang Yao-Bo⁶, Lei He-Chang⁵, Li Shao-Chun^{3, 4}, Qian Tian^{1, 7}, Sun Yu-Jie^{1, 7, ‡}, Ding Hong^{1, 7}

(a) RHEED pattern of CoSi single crystal (001) surface after grind-polish-sputter-anneal process, (b) RHEED pattern of CoSi (111) surface, RHEED pattern of (c) Mn₃Sn and (d) TiRhAs.