Time-dependent photothermal characterization on damage of fused silica induced by pulsed 355-nm laser with high repetition rate
Photothermal characterization of damage pits in fused silica irradiated by a 5-W high-frequency 355-nm laser at time t = 7/8T (a), 1T (b). (c) and (d) Optical microscopic micrograph of the irradiation points corresponding to panels (a) and (b).
