Time-dependent photothermal characterization on damage of fused silica induced by pulsed 355-nm laser with high repetition rate
Yan Chun-Yan, Liu Bao-An, Li Xiang-Cao, Liu Chang, Ju Xin
       

Photothermal characterization of damage pits in fused silica irradiated by a 5-W high frequency 355-nm laser at time t = 5/8T (a), 6/8T (b). (c) and (d) Optical microscopic photograph of irradiation points corresponding to panels (a) and (b).