Oxide-aperture-dependent output characteristics of circularly symmetric VCSEL structure

Liao Wen-Yuan^{1, 2}, Li Jian³, Li Chuan-Chuan^{2, 3}, Guo Xiao-Feng¹, Guo Wen-Tao¹, Liu Wei-Hua^{1, 2}, Zhang Yang-Jie^{1, 2}, Wei Xin^{2, 3}, Tan Man-Qing^{1, 2, †}

The 3D electric field distributions of mode superposition with oxidation aperture of (a) 2 μm, (b) 3 μm, (c) 6 μm, and (d) 9 μm.