Zhao Enyue1, 2, Zhang Zhi-Gang1, 2, Li Xiyang2, He Lunhua1, 2, 4, Yu Xiqian2, Li Hong2, Wang Fangwei1, 2, 3, 4, †
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(a) Neutron reflectivity (expressed as R × Q4) vs. Q for the sample measured during holds at the corresponding potentials. Reproduced with permission.[95] Copyright 2012, American Chemical Society. (b) NR patterns of the multilayer system at various states. Reproduced with permission.[96] Copyright 2013, American Chemical Society. (c) SLD profiles of the second lithiation and the second delithiation as a function of time and distance from the interface. Reproduced with permission.[97] Copyright 2016, American Chemical Society. (d) Neutron reflectivity profiles collected in situ for the LiMn1.5Ni0.5O4 film (top left) in air, (middle left) at the open circuit voltage, and (bottom left) charged to 4.75 V, the corresponding SLD plots represent the film thickness (top right, middle right, bottom right) and the schematics in the middle represent the layers formed from the silicon substrate out. Reproduced with permission.[98] Copyright 2014, American Chemical Society. |