AFM images showing the morphologies of VOPc thin films grown on the ITO substrate. (a) 80-nm VOPc with an RMS of 4.99 nm, (b) 160-nm VOPc with an RMS of 9.99 nm, (c) 160-nm VOPc with a post-treatment at 255 °C for 2 hours and with an RMS of 9.90 nm, (d) 160-nm VOPc with a post-treatment at 275 °C for 2 hours and with an RMS of 7.60 nm, (e) 160-nm VOPc deposited at 180 °C and with an RMS of 16.06 nm, and (f) 160-nm VOPc deposited at 250 °C and with an RMS of 37.26 nm. The height profile in each case corresponds to the black lines in the images.