Monolithic semi-polar ( 1 1 ¯ 01 ) InGaN/GaN near white light-emitting diodes on micro-striped Si (100) substrate
Wang Qi1, 2, Yuan Guo-Dong1, 2, †, Liu Wen-Qiang1, 2, Zhao Shuai1, 2, Zhang Lu1, 2, Liu Zhi-Qiang1, 2, Wang Jun-Xi1, 2, Li Jin-Min1, 2
       

(a) and (b) High-magnification cross-sectional TEM images of MQW portion, which corresponds to different parts (red squares) of panel (c). (c) TEM of MQWs portion revealing individual InGaN/GaN QWs. Dashed lines indicate the boundaries of the MQWs. (d) TEM-EDX lines scanning in direction perpendicular to QW: Line a and line b representing the center and the side of the stripe, respectively.