Effects of active layer thickness on performance and stability of dual-active-layer amorphous InGaZnO thin-film transistors
Huo Wenxing1, 2, Mei Zengxia1, †, Lu Yicheng3, Han Zuyin1, 2, Zhu Rui1, 2, Wang Tao1, 2, Sui Yanxin1, 2, Liang Huili1, Du Xiaolong1, 4, ‡
       

Output characteristics for IGZO TFTs with different thicknesses of high-R layers: (a) 4+15, (b) 4+30, (c) 4+45, and (d) 4+60.