Thermal conductivity characterization of ultra-thin silicon film using the ultra-fast transient hot strip method

Zhang Yan-Yan¹, Cheng Ran¹, Ni Dong², Tian Ming³, Lu Ji-Wu^{4, †}, Zhao Yi¹

The comparison of experimental data with the values calculated from (a) the EIT model from the low temperature region 75 K to high temperature 400 K, (b) the Landauer method in Ref. [23].