Formation and preferred growth behavior of grooved seed silicon substrate for kerfless technology

Yan Jing-Yuan^{1, 2}, Wang Yong-Wei^{1, 2}, Guo Yong-Ming^{1, 2}, Zhang Wei², Wang Cong², An Bao-Li^{1, †}, Liu Dong-Fang^{2, ‡}

Typical facet profile of grown epi-Si on grooved seed Si substrate.