Jiang Zhen-Wu1, Gao Shou-Shuai1, Wang Si-Yu1, Wang Dong-Xiao1, Gao Peng2, Sun Qiang2, Zhou Zhi-Qiang1, Liu Wei1, Sun Yun1, Zhang Yi1, †
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J–V curves of devices for
N
D
=
5
×
10
17
cm
−
3
,
N
D
=
5
×
10
18
cm
−
3
without In2S3 layer,
N
D
=
5
×
10
18
cm
−
3
with 5-nm-thick In2S3 layer remaining on Zn(O,S) layer,
N
D
=
5
×
10
18
cm
−
3
with 5-nm-thick In2S3 layer remaining on CZTSe layer.
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