Prediction of high-mobility two-dimensional electron gas at KTaO3-based heterointerfaces
Wang Fu-Ning, Li Ji-Chao †, Li Yi, Zhang Xin-Miao, Wang Xue-Jin, Chen Yu-Fei, Liu Jian, Wang Chun-Lei, Zhao Ming-Lei, Mei Liang-Mo
Calculated polarization P in the AGO (A = La and Nd) films with respect to the AGO film thickness for the (AGO)m/KTO/(AGO)m (m = 1–10) heterostructures.