Investigation and active suppression of self-heating induced degradation in amorphous InGaZnO thin film transistors
Zhang Dong1, Wu Chenfei1, Xu Weizong1, †, Ren Fangfang1, Zhou Dong1, Yu Peng2, Zhang Rong1, Zheng Youdou1, Lu Hai1, ‡
       

Transfer curves of α-IGZO TFTs with various Vquies at VD=30 V and tquies = 200 ms. The red dash line stands for transfer characteristics measured at tquies = 2000 ms, where Vth shift could be taken as zero owing to enough heat dissipation time. The inset shows the pulsed negative gate bias stressing scheme.