Pressure-mediated contact quality improvement between monolayer MoS2 and graphite Project supported by the National Key R&D Program, China (Grant No. 2016YFA0300904), the Key Research Program of Frontier Sciences of the Chinese Academy of Sciences (Grant No. QYZDB-SSW-SLH004), the Strategic Priority Research Program (B) of the Chinese Academy of Sciences (Grant Nos. XDPB06 and XDB07010100), and the National Natural Science Foundation of China (Grant Nos. 61734001 and 51572289). |
The electrical behavior of MoS2/graphite heterojunction under pressure. (a) Schematic of the measuring process and the circuit. (b) Tip–sample current as a function of tip load under bias of 1.5 V. The insert is the resistance of the MoS2/graphite junction as a function of pressure. (c) I–V curves under different pressure. |