Pressure-mediated contact quality improvement between monolayer MoS2 and graphite*

Project supported by the National Key R&D Program, China (Grant No. 2016YFA0300904), the Key Research Program of Frontier Sciences of the Chinese Academy of Sciences (Grant No. QYZDB-SSW-SLH004), the Strategic Priority Research Program (B) of the Chinese Academy of Sciences (Grant Nos. XDPB06 and XDB07010100), and the National Natural Science Foundation of China (Grant Nos. 61734001 and 51572289).

Liao Mengzhou1, 2, Du Luojun1, 2, 6, Zhang Tingting1, 2, 3, Gu Lin1, 2, Yao Yugui3, Yang Rong1, 2, 4, Shi Dongxia1, 2, 4, †, Zhang Guangyu1, 2, 4, 5, ‡
       

The electrical behavior of MoS2/graphite heterojunction under pressure. (a) Schematic of the measuring process and the circuit. (b) Tip–sample current as a function of tip load under bias of 1.5 V. The insert is the resistance of the MoS2/graphite junction as a function of pressure. (c) IV curves under different pressure.