Standing-wave spectrometry in silicon nano-waveguides using reflection-based near-field scanning optical microscopy<xref rid="cpb_28_1_010702fn1" ref-type="fn">*</xref><fn id="cpb_28_1_010702fn1"><label>*</label><p>Project supported by National Key R&D Program of China (Grant No. 2017YFA0303800), National Natural Science Foundation of China (Grant No. 61575218), and Defense Industrial Technology Development Program, China (Grant No. JCKY201601C006).</p></fn>

Standing-wave spectrometry in silicon nano-waveguides using reflection-based near-field scanning optical microscopy**

Project supported by National Key R&D Program of China (Grant No. 2017YFA0303800), National Natural Science Foundation of China (Grant No. 61575218), and Defense Industrial Technology Development Program, China (Grant No. JCKY201601C006).

Sun Yi-Zhi^{1, 2}, Ding Wei^{2, ‡}, Wang Bin-Bin³, Salas-Montiel Rafael³, Blaize Sylvain³, Bachelot Renaud³, Fan Zhong-Wei⁴, Feng Li-Shuang^{1, †}

(a) Standing-wave spectrogram measured along the central axis of the waveguide. (b) Amplitude of the spatial FT of the standing-wave profile acquired at λ = 1620.3 nm. Insert: an AFM probe repeatedly scans along the yellow dotted line (x = 0, z₀). (c) Normalized amplitudes and phases of the zero and non-zero spatial frequency peaks as a function of the wavelength. The red and the blue circles stand for the two wavelengths used in the NSOM imaging (see Fig. 3).