Coupling-induced spectral splitting for plasmonic sensing with ultra-high figure of merit<xref rid="cpb_27_11_117302fn1" ref-type="fn">*</xref> <fn id="cpb_27_11_117302fn1"> <label>*</label> <p>Project supported by the National Key R&D Program of China (Grant No. 2017YFA0303800), the National Natural Science Foundation of China (Grant Nos. 61705186, 11634010, and 11774290), the Natural Science Basic Research Plan in Shaanxi Province, China (Grant No. 2017JQ1023), the Technology Foundation for Selected Overseas Chinese Scholar of Shaanxi Province, China (Grant No. 2017007), and the Fundamental Research Funds for the Central Universities, China (Grant Nos. 3102018zy039 and 3102018zy050).</p> </fn>

Coupling-induced spectral splitting for plasmonic sensing with ultra-high figure of merit* *

Project supported by the National Key R&D Program of China (Grant No. 2017YFA0303800), the National Natural Science Foundation of China (Grant Nos. 61705186, 11634010, and 11774290), the Natural Science Basic Research Plan in Shaanxi Province, China (Grant No. 2017JQ1023), the Technology Foundation for Selected Overseas Chinese Scholar of Shaanxi Province, China (Grant No. 2017007), and the Fundamental Research Funds for the Central Universities, China (Grant Nos. 3102018zy039 and 3102018zy050).

Lu Hua^†, Fan Yi-Cun, Dai Si-Qing, Mao Dong, Xiao Fa-Jun, Li Peng, Zhao Jian-Lin

(color online) Evolution of reflection spectrum with the thickness of the second SiO₂ layer d₄ when n₆ = 1. Here, θ = 80°, d₁ = 60nm, d₂ = 2.0 μm, d₃ = 635 nm, and d₅ = 277 nm.