Thickness dependent manipulation of uniaxial magnetic anisotropy in Fe-thin films by oblique deposition
Gul Qeemat1, 2, He Wei1, 2, Li Yan1, 2, Sun Rui1, 2, Li Na1, 2, Yang Xu1, 2, Li Yang1, 2, Gong Zi-Zhao1, 2, Xie ZongKai1, 2, Zhang Xiang-Qun1, Cheng Zhao-Hua1, 2, †
       

Anisotropy constants Ku and Kl versus applied magnetic field (H) of Fe thin films deposited at different deposition angles: (a) 0°, (b) 45°, (c) 55°, and (d) 70°.