Thickness dependent manipulation of uniaxial magnetic anisotropy in Fe-thin films by oblique deposition

Gul Qeemat^{1, 2}, He Wei^{1, 2}, Li Yan^{1, 2}, Sun Rui^{1, 2}, Li Na^{1, 2}, Yang Xu^{1, 2}, Li Yang^{1, 2}, Gong Zi-Zhao^{1, 2}, Xie ZongKai^{1, 2}, Zhang Xiang-Qun¹, Cheng Zhao-Hua^{1, 2, †}

Anisotropy constants K_u and K_l versus applied magnetic field (H) of Fe thin films deposited at different deposition angles: (a) 0°, (b) 45°, (c) 55°, and (d) 70°.