Thickness dependent manipulation of uniaxial magnetic anisotropy in Fe-thin films by oblique deposition

Gul Qeemat^{1, 2}, He Wei^{1, 2}, Li Yan^{1, 2}, Sun Rui^{1, 2}, Li Na^{1, 2}, Yang Xu^{1, 2}, Li Yang^{1, 2}, Gong Zi-Zhao^{1, 2}, Xie ZongKai^{1, 2}, Zhang Xiang-Qun¹, Cheng Zhao-Hua^{1, 2, †}

(color online) (a) Angle-dependent MR measurement (H = 500 Oe) at different deposition angle α and with cos²(φ_H) as a reference for comparison. (b) Correlation between φ_H and φ_M at different deposition angle α. Inset shows schematic configuration of sample resistance measurement as a function of angle φ_M, which is between the magnetization (M) and current (I).