Key technologies for dual high-k and dual metal gate integration*

Project supported by the National High Technology Research and Development Program of China (Grant No. 2015AA010601).

Li Yong-Liang, Xu Qiu-Xia, Wang Wen-Wu
       

(a) IDSVDS and (b) IDSVGS curves of a CMOS device using these newly developed key technologies for DHDMG integration.