Key technologies for dual high-k and dual metal gate integration*

Project supported by the National High Technology Research and Development Program of China (Grant No. 2015AA010601).

Li Yong-Liang, Xu Qiu-Xia, Wang Wen-Wu
       

Hf 4f XPS spectrum analysis under BCl3/Ar plasma only and BCl3/Ar plasma combined with following DHF/HCl/alcohol solution clean.