Key technologies for dual high-k and dual metal gate integration*

Project supported by the National High Technology Research and Development Program of China (Grant No. 2015AA010601).

Li Yong-Liang, Xu Qiu-Xia, Wang Wen-Wu
       

(a) Tapered TaN and (b) vertical TaN/Mo profiles obtained under optimized BCl3/Cl2/O2/Ar plasma for TaN/Mo stack.