Key technologies for dual high-k and dual metal gate integration
Project supported by the National High Technology Research and Development Program of China (Grant No. 2015AA010601).
(color online) Process flow of CMOS device with DHDMG process.
Key technologies for dual high-k and dual metal gate integration Project supported by the National High Technology Research and Development Program of China (Grant No. 2015AA010601). |
(color online) Process flow of CMOS device with DHDMG process. |
| |