Growth of high-quality perovskite (110)-SrIrO3 thin films using reactive molecular beam epitaxy*

Project supported by the National Key Research and Development Program of the MOST of China (Grant No. 2016YFA0300204), the National Key Basic Research Program of China (Grant No. 2015CB654901), the National Natural Science Foundation of China (Grant Nos. 11574337, 11227902, 11474147, and 11704394), Shanghai Sailing Program (Grant No. 17YF1422900), and the Award for Outstanding Member in Youth Innovation Promotion Association of the Chinese Academy of Sciences.

Zhang Kai-Li1, 2, Fan Cong-Cong1, 2, Liu Wan-Ling3, Wu Yu-Feng1, 2, Lu Xiang-Le1, 2, Liu Zheng-Tai1, 4, Liu Ji-Shan1, 4, Liu Zhong-Hao1, 4, Shen Da-Wei1, 4, ‡
       

(color online) (a) AFM image of SrIrO3 film. (b) The mean roughness over 2 μm is about 0.5 nm. (c) XRD pattern of SrIrO3 film. (d) T-dependent ρ curves for (001)-SrIrO3 and (110)-SrIrO3.