Characterization of ion irradiated silicon surfaces ablated by laser-induced breakdown spectroscopy

Iqbal T^{1, ‡}, Abrar M^{2, §}, Tahir M B¹, Seemab M¹, Majid A¹, Rafique S³

(a) XRD pattern of n-type silicon before irradiation whereas panels (b), (c), (d), and (e) represent XRD patterns of substrate after irradiation of Al, Ti, Cu, and Au, respectively.