Optoelectronic properties of bottom gate-defined in-plane monolayer WSe2 p–n junction Project supported by the National Key Research and Development Program of China (Grant No. 2016YFA0301700), the National Natural Science Foundation of China (Grant Nos. 61590932, 11774333, 61674132, 11674300, 11575172, and 11625419), the Anhui Provincial Initiative in Quantum Information Technologies, China (Grant Nos. AHY080000 and AHY130300), the Strategic Priority Research Program of the Chinese Academy of Sciences (Grant No. XDB24030601), and the Fundamental Research Funds for the Central Universities, China. This work was partially carried out at the USTC Center for Micro and Nanoscale Research and Fabrication. |
(color online) Optoelectronic characterization of the PN junction (Vlg = −4 V, Vrg = 6 V) excited by a 532-nm diode laser, showing (a) current–voltage of source–drain relation under different laser powers, (b) photocurrents of PN junction under different laser powers, (c) photocurrent as a function of laser power under different bias voltages, and (d) photoresponsivity versus laser power in the PN junction region. |