Investigations on mesa width design for 4H–SiC trench super junction Schottky diodes<xref rid="cpb_27_8_087102fn1" ref-type="fn">*</xref> <fn id="cpb_27_8_087102fn1"><label>*</label> <p>Project supported by the National Key Research and Development Program of China (Grant No. 2016YFB0400502) and the National Natural Science Foundation of China (Grant Nos. U1766222 and 51777187).</p></fn>

Investigations on mesa width design for 4H–SiC trench super junction Schottky diodes* *

Project supported by the National Key Research and Development Program of China (Grant No. 2016YFB0400502) and the National Natural Science Foundation of China (Grant Nos. U1766222 and 51777187).

Zhong Xue-Qian², Wang Jue^{1, †}, Wang Bao-Zhu², Wang Heng-Yu², Guo Qing², Sheng Kuang²

Cross-sectional SEM image of the SiC deep trenches, (a) 6-μm deep and (b) 8.1-μm deep.