Effect of substrate curvature on thickness distribution of polydimethylsiloxane thin film in spin coating process<xref rid="cpb_27_6_068104_fn1" ref-type="fn">*</xref> <fn id="cpb_27_6_068104_fn1"> <label>*</label> <p>Project supported by the National Natural Science Foundation of China (Grant Nos. 51605079 and 51475076), the Science Fund for Creative Research Groups of the National Natural Science Foundation of China (Grant No. 51621064), and the China Postdoctoral Science Foundation (Grant No. 2016M591424).</p> </fn>

Effect of substrate curvature on thickness distribution of polydimethylsiloxane thin film in spin coating process* *

Project supported by the National Natural Science Foundation of China (Grant Nos. 51605079 and 51475076), the Science Fund for Creative Research Groups of the National Natural Science Foundation of China (Grant No. 51621064), and the China Postdoctoral Science Foundation (Grant No. 2016M591424).

Yan Ying^†, Zhou Ping, Zhang Shang-Xiong, Guo Xiao-Guang, Guo Dong-Ming

(color online) (a) Film thickness distributions along radial direction on planar substrate and concave substrate (center deformation 450 μm) at spin speeds of 1000 rpm and 3000 rpm. (b) Film thickness distributions at the spin speed of 3000 rpm. The solution was spun on planar substrate ora concave substrate and dried on a planar substrate and a concave substrate separately. The substrate center is set as zero point of x axis.