Effect of substrate curvature on thickness distribution of polydimethylsiloxane thin film in spin coating process<xref rid="cpb_27_6_068104_fn1" ref-type="fn">*</xref> <fn id="cpb_27_6_068104_fn1"> <label>*</label> <p>Project supported by the National Natural Science Foundation of China (Grant Nos. 51605079 and 51475076), the Science Fund for Creative Research Groups of the National Natural Science Foundation of China (Grant No. 51621064), and the China Postdoctoral Science Foundation (Grant No. 2016M591424).</p> </fn>

Effect of substrate curvature on thickness distribution of polydimethylsiloxane thin film in spin coating process* *

Project supported by the National Natural Science Foundation of China (Grant Nos. 51605079 and 51475076), the Science Fund for Creative Research Groups of the National Natural Science Foundation of China (Grant No. 51621064), and the China Postdoctoral Science Foundation (Grant No. 2016M591424).

Yan Ying^†, Zhou Ping, Zhang Shang-Xiong, Guo Xiao-Guang, Guo Dong-Ming

(color online) (a) Film thickness distributions along radial direction on planar substrate and convex substrate (center deformation 250 μm) at spin speeds of 1000 rpm, 3000 rpm, and 5000 rpm. Substrate center is set as the zero point of x axis. (b) Mechanical schematic plot of PDMS micro-unit on convex substrate during spin coating.