Effect of substrate curvature on thickness distribution of polydimethylsiloxane thin film in spin coating process<xref rid="cpb_27_6_068104_fn1" ref-type="fn">*</xref> <fn id="cpb_27_6_068104_fn1"> <label>*</label> <p>Project supported by the National Natural Science Foundation of China (Grant Nos. 51605079 and 51475076), the Science Fund for Creative Research Groups of the National Natural Science Foundation of China (Grant No. 51621064), and the China Postdoctoral Science Foundation (Grant No. 2016M591424).</p> </fn>

Effect of substrate curvature on thickness distribution of polydimethylsiloxane thin film in spin coating process* *

Project supported by the National Natural Science Foundation of China (Grant Nos. 51605079 and 51475076), the Science Fund for Creative Research Groups of the National Natural Science Foundation of China (Grant No. 51621064), and the China Postdoctoral Science Foundation (Grant No. 2016M591424).

Yan Ying^†, Zhou Ping, Zhang Shang-Xiong, Guo Xiao-Guang, Guo Dong-Ming

(color online) (a) Film thickness distributions along radial direction on a planar substrate with various spin speeds (1000 rpm, 2000 rpm, 3000 rpm, 5000 rpm, 8000 rpm). Substrate center is set as zero point of x axis. (b) Film surface topology with spin speed 3000 rpm.