Effect of substrate curvature on thickness distribution of polydimethylsiloxane thin film in spin coating process<xref rid="cpb_27_6_068104_fn1" ref-type="fn">*</xref> <fn id="cpb_27_6_068104_fn1"> <label>*</label> <p>Project supported by the National Natural Science Foundation of China (Grant Nos. 51605079 and 51475076), the Science Fund for Creative Research Groups of the National Natural Science Foundation of China (Grant No. 51621064), and the China Postdoctoral Science Foundation (Grant No. 2016M591424).</p> </fn>

Effect of substrate curvature on thickness distribution of polydimethylsiloxane thin film in spin coating process* *

Project supported by the National Natural Science Foundation of China (Grant Nos. 51605079 and 51475076), the Science Fund for Creative Research Groups of the National Natural Science Foundation of China (Grant No. 51621064), and the China Postdoctoral Science Foundation (Grant No. 2016M591424).

Yan Ying^†, Zhou Ping, Zhang Shang-Xiong, Guo Xiao-Guang, Guo Dong-Ming

Schematic diagram of a thin film flow.