Structural and electrical properties of reactive magnetron sputtered yttrium-doped HfO<sub><bold>2</bold></sub> films

Structural and electrical properties of reactive magnetron sputtered yttrium-doped HfO₂ films

Zhang Yu¹, Xu Jun^{1, †}, Zhou Da-Yu², Wang Hang-Hang¹, Lu Wen-Qi¹, Choi Chi-Kyu³

(color online) Plots of leakage current density J versus applied voltage for Y-doped HfO₂ films grown on Si with different Y contents.