Structural and electrical properties of reactive magnetron sputtered yttrium-doped HfO<sub><bold>2</bold></sub> films

Structural and electrical properties of reactive magnetron sputtered yttrium-doped HfO₂ films

Zhang Yu¹, Xu Jun^{1, †}, Zhou Da-Yu², Wang Hang-Hang¹, Lu Wen-Qi¹, Choi Chi-Kyu³

HRTEM micrographs for HfO₂ films with different Y content: (a) pure HfO₂; (b) Y-9.2 mol%. Insets in panels (a) and (b) show selective area electron diffraction patterns.