Structural and electrical properties of reactive magnetron sputtered yttrium-doped HfO<sub><bold>2</bold></sub> films

Structural and electrical properties of reactive magnetron sputtered yttrium-doped HfO₂ films

Zhang Yu¹, Xu Jun^{1, †}, Zhou Da-Yu², Wang Hang-Hang¹, Lu Wen-Qi¹, Choi Chi-Kyu³

(color online) XPS measured content of Y and Hf versus Y target power in the films.