Off-stoichiometry indexation of BiFeO3 thin film on silicon by Rutherford backscattering spectrometry
Surface morphological and cross-sectional SEM images of BiFeO3/Si annealed at ((a) and (b)) 500 °C and ((c) and (d)) 600 °C, respectively.
Off-stoichiometry indexation of BiFeO3 thin film on silicon by Rutherford backscattering spectrometry |
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Surface morphological and cross-sectional SEM images of BiFeO3/Si annealed at ((a) and (b)) 500 °C and ((c) and (d)) 600 °C, respectively. |
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