Passivation of carbon dimer defects in amorphous SiO2/4H–SiC (0001) interface: A first-principles study
Zhang Yi-Jie1, Yin Zhi-Peng1, Su Yan2, Wang De-Jun1, †
       

(color online) (a) O2–C = C–O2 defect structure after H2 passivation, (b) its total DOS, and (c) PDOSs of atoms in the passivation region.