Phase shift effects of radio-frequency bias on ion energy distribution in continuous wave and pulse modulated inductively coupled plasmas

Xue Chan¹, Gao Fei^{1, †}, Liu Yong-Xin¹, Liu Jia², Wang You-Nian^{1, ‡}

(color online) Measured voltage waveforms on the biased substrate at different pressures (10 mTorr, 30 mTorr, and 50 mTorr). The other conditions are as follows: source power is 100 W, applied bias voltage (peak-peak voltage) is 200 V, and phase shift θ = π.