Phase shift effects of radio-frequency bias on ion energy distribution in continuous wave and pulse modulated inductively coupled plasmas
Xue Chan1, Gao Fei1, †, Liu Yong-Xin1, Liu Jia2, Wang You-Nian1, ‡
       

(color online) (a) Measured voltage waveforms and (b) sheath potentials on biased substrate at different phase angles θ = 0, π/2, and π. The other conditions are as follows: source power is 100 W, pressure is 10 mTorr, and applied bias voltage (peak–peak voltage) is 200 V.