(color online) (a) Fabrication sequence used in the present study to create tilted arrays. Nano-structures were masked using a dewet film of platinum. The dewet film consists of circular metal islands that serve as an etch mask. Microstructures were masked with either a positive or negative resist and patterned with photolithography. (b) Reactive ion etching (RIE) of each masked substrate tilted at a 70° angle relative to the carrier wafer resulted in tilted arrays of the masked features. (c) The tilted arrays were then functionalized with a self-assembled monolayer of a silane (from Ref. [59], Fig. 1).